The preparation of thin continuous alumina film at the surface of metal substrate in UHV (ultra high vacuum) conditions is described. The peculiarities of the obtained films studied by XPS (X-ray photoelectron spectroscopy) and STM (scanning tunneling microscopy) are discussed. The long-term durability of the oxide film was tested and proved both under ambient conditions and in acidic aqueous solutions. The stability of the planar alumina samples toward oxidation by oxygen was checked in the wide ranges of gas pressure and sample temperature. The suggested procedure ensures the controlled and reproducible preparation of thin alumina films - model support appropriate for wet chemistry catalyst preparation, suitable for STM and for other Surface Science techniques studies of alumina supported metal catalysts. (C) 2015 Elsevier B.V. All rights reserved.