화학공학소재연구정보센터
Journal of Materials Science, Vol.29, No.2, 404-411, 1994
Structure and Morphology of Titanium Nitride Films Deposited by Laser-Induced Chemical-Vapor-Deposition
Results on the deposition of titanium nitride on AISI M2 tool steel-type substrates by pyrolytic laser chemical vapour deposition are reported. Spots of TiN were deposited from a gas mixture of TiCl4, nitrogen and hydrogen using a continuous wave quasi-TEM(00) CO2 laser beam. The morphology and the structure of the deposited material were investigated by optical microscopy, scanning electron microscopy and X-ray diffraction. The chemical composition was studied with a scanning electron microscope with an energy dispersive spectrometer, and with an electron probe microanalyser. The topography of the coating was analysed with a stylus profilometer and different thickness profiles were measured depending on the laser-power densities and irradiation times. The morphology of the films showed a strong dependence on the laser-power density, interaction time and partial pressure of TiCl4.