Carbon fibres were coated with layers of silicon carbide (SIG) and boron nitride (BN) by conventional chemical vapour deposition. The SiC films were deposited by thermal decomposition of methyltrichlorosilane, whereas the BN films were deposited using the stepwise disproportion reaction of boron chloride with ammonia. Samples for electron microscopic investigations were prepared by separating film from fibre or by conventional mechanical thinning and subsequent ion milling of cross sections of coated fibres. Bright- and dark-field images of both planar and cross-sectional electron microscopic investigations on the fibre coatings gave detailed information on film thickness and morphology. High-resolution images improved the structural information of electron diffraction patterns. Crystal dimensions in the SiC film vary between 10 and 40 nm. Electron diffraction revealed the crystal structure to be a mixture of disordered hexagonal 2H-SiC and cubic beta-SiC. High-resolution images showed the (111)-planes to be preferred for deposition. In BN films, a hexagonal turbostratic structure similar to turbostratic carbon was observed. Apart from amorphous regions, nanocrystalline parts were detected, which have a higher structural perfection in the stacking sequence of their (002)-planes compared to the (002)-planes of the turbostratic carbon fibre. High-resolution images located the film-fibre interface that was confirmed by electron energy loss spectroscopy.