화학공학소재연구정보센터
Journal of Crystal Growth, Vol.432, 45-48, 2015
Double acceptor in p-type GaAsN grown by chemical beam epitaxy
The properties of the acceptor states in GaAsN grown by chemical beam epitaxy (CBE) are studied by analyzing their charges based on the Poole-Frenkel model. Deep level transient spectroscopy (DLTS) shows two acceptor levels at 0.11 and 0.19 eV above the valence band maximum. The emission rates of carriers from these states are enhanced with increasing the electric field during the DLTS measurement, which indicates that the energies required for the emission are decreased. By analyzing this field-enhanced emission process, the polarizabilities of the levels at 0.11 and 0.19 eV are found to be 1 (+/- 0.1) and -2 (+/- 0.1), respectively. In addition, these states have almost the same concentration. Therefore, we conclude that they originate from the same defect, acting as a double acceptor in GaAsN film grown by CBE. (C) 2015 Elsevier B.V. All rights reserved.