화학공학소재연구정보센터
Materials Chemistry and Physics, Vol.166, 37-41, 2015
Synthesis and characterization of graphene layers prepared by low-pressure chemical vapor deposition using triphenylphosphine as precursor
The synthesis of a single-layer graphene using a low-pressure Chemical Vapor Deposition (CVD) system with triphenylphosphine as precursor is reported. The amount of triphenylphosphine used as precursor was in the range of 10-40 mg. Raman spectroscopy was employed to analyze samples prepared with 10 mg of the precursor, and these spectra were found typical of graphene. The Raman measurements indicate that the progressive degradation of graphene occurs as the amount of triphenylphosphine increases. X-ray photoelectron spectroscopy measurements were performed to investigate the different chemical environments involving carbon and phosphorous atoms. Scanning electron microscopy and transmission electron microscopy were also employed and the results reveal the formation of dispersed nanostructures on top of the graphene layer, In addition, the number of these nanostructures is directly related to the amount of precursor used for sample growth. (C) 2015 Elsevier B.V. All rights reserved.