Titania (TiO2) and hafnium oxide (HfO2) thin films are in the focus of interest to the microelectronics community from a dozen years. Because of their outstanding properties like, among the others, high stability, high refractive index, high electric permittivity, they found applications in many optical and electronics domains. In this work discussion on the hardness, microstructure and optical properties of as-deposited and annealed HfTiO4 thin films has been presented. Deposited films were prepared using magnetron co-sputtering method. Performed investigations revealed that as-deposited coatings were nanocrystalline with HfTiO4 structure. Deposited films were built from crystallites of ca. 4-12 nm in size and after additional annealing an increase in crystallites size up to 16 nm was observed. Micromechanical properties, i.e., hardness and elastic modulus were determined using conventional load-controlled nanoindentation testing. the annealed films had 3-times lower hardness as-compared to as-deposited ones (similar to 9 GPa). Based on optical investigations real and imaginary components of refractive index were calculated, both for as-deposited and annealed thin films. The real refractive index component increased after annealing from 2.03 to 2.16, while extinction coefficient increased by an order from 10(-4) to 10(-3). Structure modification was analyzed together with optical energy band-gap, Urbach energy and using Wemple-DiDomenico model. (C) 2015 Elsevier Ltd. All rights reserved.