Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.14, No.18, 1263-1267, 1995 DOI10.1007/BF01262262 Export Citation On the Applicability of the Sharp Interface Model in Modeling the Kinetics of the Direct Nitridation of Silicon Jovanovic ZR Keywords:HIGH-PURITY SILICON Please enable JavaScript to view the comments powered by Disqus.
