Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.15, No.4, 343-344, 1996 DOI10.1007/BF00591657 Export Citation Phosphorus and Boron Doping Effects on Solid-Phase Recrystallization of Polycrystalline Silicon Films Amorphized by Germanium Ion-Implantation Kang MY, Yamamoto T, Matsui T, Kuwano H Please enable JavaScript to view the comments powered by Disqus.
