Solar Energy Materials and Solar Cells, Vol.144, 352-358, 2016
In-situ fabrication of metal-semiconductor (M-S) plasmonic thin films by a chemical spray pyrolysis technique: Optical properties
This manuscript focuses on the fabrication of metal-semiconductor (M-S) hybrid thin films using simple and cost-effective spray pyrolysis technique. Various host matrices were chosen to demonstrate the versatility of our technique. The absorption characteristics of in-situ grown noble metal nanoparticles into the various host matrices (CdS, ZnO, ZnS, PbS, CuInS2) have been demonstrated. The brilliant colors of M-S films are because of the surface plasmon resonance (SPR) absorption governed by the metal nanoparticles size, shape, morphology and the dielectric constant of the host matrix. The SPR peak due to the gold (Au) domains was observed in the visible-NIR region (550-1000 nm) which can be tuned with Au loading in the host matrix. The structural and morphological characterizations were carried out using XRD and TEM that reveals the distinct phases of Au and host material. The in-situ growth mechanism of Au domains in the host matrix has been also described. (C) 2015 Elsevier B.V. All rights reserved.