화학공학소재연구정보센터
Thin Solid Films, Vol.591, 261-266, 2015
In-situ investigation of optical transmittance in metal thin films
The results of in-situ spectroscopic investigation of metal thin films transmittance during the growth process are presented. Thin films of Au, Ag, Cu, and Ni were deposited on sapphire substrates by dc sputtering method in the triode sputtering setup. The sputtering process was provided at an argon pressure of 1 m Torr using the constant sputtering voltage of 1.5 kV. The transmittance spectra were recorded in the 200-1100 nm wavelength range through the growing thin metal films. (C) 2015 Elsevier B.V. All rights reserved.