화학공학소재연구정보센터
Thin Solid Films, Vol.595, 239-243, 2015
Gas-phase reaction kinetics of 1,3-disilacyclobutane in a hot-wire chemical vapor deposition reactor
The reaction kinetics of the decomposition of 1,3-disilacyclobutane (DSCB) was investigated using a hot-wire chemical vapor deposition reactor. The reaction products were monitored using a vacuum ultraviolet laser single-photon ionization source coupled with a time-of-flight mass spectrometer. Steady-state approximation was used to determine the rate constants for three main decomposition pathways of DSCB: the exocyclic H-2 elimination (k(1)), the cycloreversion (k(2)), and the ring-opening via 1,2-H shift (k(3)). Separate k(2) and k(3) were not obtained, but 2k(2) + k(3) and k(1) were determined. The activation energy (E-a) for the exocyclic H-2 elimination reaction was determined to be 63.5 kJ.mol(-1). Compared to the E-a value of 43.6 kJ.mol(-1) previously obtained under collision-free conditions at much lower pressures, the value from this work is higher. This is attributed to the filament aging caused by the formation of silicon carbide (SiC) and tungsten sub-carbide (W2C) on the wire surface. The heterogeneous reactions on the metal surface also led to a much faster decay constant, koverall, for DSCB than those for each individual decomposition pathway, k(1) and 2k(2) + k(3). (C) 2015 Elsevier B.V. All rights reserved.