Molecular Crystals and Liquid Crystals, Vol.437, 1297-1297, 2005
3D soft microlithography in segmented anisotropic urethane/urea elastomers
In this work we describe a way to readily transfer 2D pictures from a mask to 3D structures oil flexible free standing urethane/urea substrates. The resultant 3D picture can easily be erased/rewritten or permanently imprinted in the elastomer. The 3D microstructures are induced by LW radiation and can be revealed by application of a mechanical field or by immersing and drying the elastomer in an appropriate solvent. The film casting conditions induces an orientational order of the segregated soft and hard parts of the copolymer that is enhanced by UV radiation which is thought to make up the anisotropic structure that is responsible for the features observed. The copolymer is prepared by extending a poly(propylene oxide)-based triisocyanate terminated prepolymer (PU) with poly(butadienediol) (PBDO; 40% wt).