We have investigated selective photoluminescence dye patterning using light stamping lithography (LSL) technique. Polydimethylsiloxane (PDMS) stamp was used for the substrate mold in LSL. In order to determine the formation of patterned PDMS molds, photoluminescence dye was prepared with diaminomaleonitrile moiety and selectively deposited on the patterned PDMS molds. UV-vis absorption and photoluminescence (PL) spectra of the dye were determined at 535 nm and 580 nm, respectively. The corresponding selective dye layer deposition was formed by hydrophobic interactions between PDMS and dye molecules.