Tin-doped Indium Oxide (ITO) thin films for plasma display panels (PDP) were deposited on KCC KM65-2 PDP glass substrates by a medium frequency (MF) dual magnetron sputtering (DMS). During growing films, the oxygen and argon ratios were varied from 0% to 2.67%. We investigated the film structure, the surface morphology, the electro-optical characteristics and film thickness by X-ray diffraction (XRD), four point probes, spectrophotometer and ellipsometer, respectively. In electrical and physical characteristics with peak transmittance of over 90% at 470480nm, sheet resistance of under 20/sq and film thickness of 110050, available to PDP without any post-treatments.