Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.15, No.24, 2145-2148, 1996 Export Citation Effects of Ambient Gases on the Formation of Sioxny Films by KrF Laser-Ablation of Si3N4 Target with a Shadow Mask Maruyama K, Aoki Y, Hiroshima Y, Ohta H Please enable JavaScript to view the comments powered by Disqus.
