Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.17, No.17, 1507-1509, 1998 DOI10.1023/A:1026459309199 Export Citation Metal-oxide-semiconductor characteristics of tantalum oxide thin films grown by 172 nm radiation Zhang JY, Boyd IW Keywords:AMORPHOUS TA2O5 FILMS;DEPOSITION;DRAMS Please enable JavaScript to view the comments powered by Disqus.
