In this work, we describe ripple and dot nanopatterning of three different aromatic polymer substrates by KrF excimer laser treatment. The conditions for regular structures were established by laser fluence and number of pulses. Subsequently, the influence of the angle of incidence of a laser beam was investigated. We have chosen polyethersulfone (PES), polyetherimide (PEI) and polyetheretherketone (PEEK) as substrates for modification since they are thermally, chemically and mechanically resistant aromatic polymers with high absorption coefficients at excimer laser wavelength. As a tool of wettability investigation, we used contact angle measurement and for determination of the absorption edge, UV-vis spectroscopy was used. Material surface chemistry was analyzed using FTIR and the changes caused by modification were gained as differential spectra by subtraction of the spectra of non-modified material. Surface morphology was investigated by atomic force microscopy, also the roughness and surface area of modified samples were studied. The scans showed the formation of regular periodic structures, ripples and dots, after treatment by 8 and 16 mJ cm(-2) and 6000 pulses. Further, initial in vitro cytocompatibility tests were performed using U-2 OS cell line growing on PES samples subjected to scanning electron microscopy analysis. The structure formation mapping contributes strongly to development of new applications using nanostructured polymers, e.g. in tissue engineering or in combination with metallization in selected electronics and metamaterials construction. (C) 2016 Elsevier B.V. All rights reserved.