Previous Article Next Article Table of Contents International Journal of Heat and Mass Transfer, Vol.102, 77-85, 2016 DOI10.1016/j.ijheatmasstransfer.2016.06.009 Export Citation Mechanism of TCO thin film removal process using near-infrared ns pulse laser: Plasma shielding effect on irradiation direction Kim Byunggi, Iida Ryoichi, Hong Duc Doan, Fushinobu Kazuyoshi Please enable JavaScript to view the comments powered by Disqus.
