Thin Solid Films, Vol.612, 172-178, 2016
Hydrogen insertion in titanium carbide based thin films (nc-TiCx/a-C:H) - comparison with bulk TiCx
Nanocomposites composed of titanium carbide nanosized grains embedded in an amorphous hydrogenated carbon matrix (nc-TiCx/a-C:H) are prepared by hybrid Magnetron Sputtering - PECVD process using a titanium metal target and gaseous C6H6. By controlling the benzene flow rate, thin films with different carbon content are obtained. The structures of nc-TiCx/a-C: H materials are analyzed by X-ray diffraction, X-ray photoelectron and Raman spectroscopic methods. The electrochemical hydrogen insertion, as studied by cyclic voltammetry, strongly depends on the carbon content in the thin films. The correlation between the hydrogen insertion ability and the structure of materials are discussed. Furthermore, we show that the hydrogen insertion in these thin films reaches values much more significant than in bulk substoichiometric titanium carbide obtained by reactive sintering. (C) 2016 Elsevier B.V. All rights reserved.
Keywords:Reactive sputtering;Hybrid PVD-PECVD process;Titanium carbide thin films;Amorphous carbon;Nanocomposite;Electrochemical hydrogen insertion