Electron-stimulated desorption of anions from CFCl3 condensed and adsorbed on a cold metallic surface (Au) in the ultrahigh vacuum is studied in the energy range 0-15 eV. The results are compared with the corresponding processes in the gas phase. Below 10 eV, we observe F- and Cl- desorption via dissociative electron attachment and above approximate to 10 eV via dipolar dissociation. In both cases F- is more intense by approximately 1 order of magnitude, which points toward a preferential orientation of the molecule at the surface. Gas-phase CFCl3, in contrast, is characterized by an exceedingly high cross section for Cl- formation from a resonance near 0 eV and a comparatively low F- intensity from a resonance near 3 eV. From condensed molecules, Cl- formation at very low energies (<2 eV) is only observed from multilayer films and from submonolayer CFCl3 adsorbed on Kr and Xe spacers, but not from submonolayer CFCl3 adsorbed directly on the metallic substrate. This is explained by the larger polarizability of the metal which prevents desorption of Cl- at low energies. The Cl- signal from submonolayer CFCl3 on Kr and Xe solids exhibits a sharp structure which is due to a secondary process involving excitation of the rare gas substrate. It is shown that extensive exposure of multilayer CFCl3 films to the electron beam causes strong charging of the film due to trapped electrons.