Journal of Crystal Growth, Vol.451, 18-26, 2016
InP nanowire p-type doping via Zinc indiffusion
We report an alternative pathway for p-type InP nanowire (NW) doping by diffusion of Zn species from the gas phase. The diffusion of Zn was performed in a MOVPE reactor at 350-500 degrees C for 5-20 min with either H-2 environment or additional phosphorus in the atmosphere. In addition, Zn3P2 shells were studied as protective caps during post-diffusion annealing. This post-diffusion annealing was performed to outdiffuse and activate Zn in interstitial locations. The characterization methods included photoluminescence and single NW conductivity and carrier concentration measurements. The acquired carrier concentrations were in the order of > 10(17) cm(-3) for NWs without post-annealing, and up to 10(18) cm(-3) for NWs annealed with the Zn3P2 shells. The diffused Zn caused redshift to the photoluminescence signal, and the degree of redshift depended on the diffusion process. (C) 2016 Elsevier B.V. All rights reserved.
Keywords:Annealing;Doping;Metalorganic vapor phase epitaxy;Diffusion;Semiconducting III-V materials;Field effect transistors