High-quality single-crystal anatase TiO2(a_Tio2) thin films have been obtained on SrTiO3 (STO) substrates using the metalorganic chemical vapor deposition (MOCVD) method. The optimal preparation process was explored. The lattice structure and epitaxial relationship were investigated by X-ray diffraction (XRD, both theta-2 theta and phi scans) and transmission electron microscopy (TEM). The results indicated that the film prepared at 550 degrees C with the Ti precursor molar flow rate of 4 x 10(-7) mol/min had the best single crystalline quality, for which a clear epitaxial relationship of a-TiO2 (001)parallel to STO (100) with a-TiO2 [100]parallel to STO [00 (1) over bar] could be inferred. The elemental composition and proportion were studied by the X-ray photoelectron spectroscopy (XPS) method, which proved the deposited film approximated stoichiometric TiO2. The samples showed high transparency of 70-80% in the visible range. (C) 2016 Elsevier B.V. All rights reserved.