Organic molecular beam deposition (OMBD) was used to;selectively grow phase I and phase II titanylphthalocyanine (TiOPc) thin films deposited on sapphire R(<1(1)over bar 02>) surfaces. The dependence of the crystal phase and film quality on substrate temperature and deposition rate were investigated by X-ray diffraction, UV and visible absorption spectroscopy, and scanning electron microscopy. Crystalline films were not obtained at substrate temperatures of 25 degrees C or less. Phase II growth occurred at and above 100 degrees C, and the optimum growth condition for phase II was 150 degrees C and 0.2 nm/min. The mixture of another phase was observed when the growth temperature was higher than 150 OC. Phase I growth was observed only at 100 degrees C, and the optimum deposition rate for phase I was 0.05 nm/min. The crystal quality and surface flatness of phase I films were not as good as those of phase II, films. A large red shift in the Q-band peak was observed in absorption spectra of phase LI films. The origin of this red shift is discussed according to the molecular exciton theory. Precise control of the substrate temperature and deposition rate possible by OMBD enabled phase-selective growth of TiOPc thin films. The correlation between phases and absorption spectra of TiOPc is discussed.