Sn-x-W(100-x)-oxide coatings (x = 0, 20, 40, 60, 80 and 100) doped with Sb (similar to 3 at.%) were formed on a Ti substrate by a thermal deposition method in order to evaluate their potential use as electrodes for the photoelectrochemical oxidation of organic compounds. Surface microstructure/morphology and chemical composition of the coatings, as well as their photoelectrocatalytic activities were investigated using electrochemical and surface-characterization techniques. It was found that the surface roughness of the coatings depends on their composition, yielding an average value of R-a = 1.1 +/- 0.5 mu m. The band gap energy was found to be independent on the coating composition up to the relative W/Sn at. ratio of 4/6, yielding an average value of 3.53 +/- 0.05 eV (which corresponds to the band gap of doped SnO2), but then it decreased for the three coatings with the highest W content, to an average value of 2.56 +/- 0.10 eV (which corresponds to the value of pure WO3). All the coatings were found to be photoactive under the anodic bias. Further, all the coatings were found to be photoelectrochemically active towards the degradation of phenol red dye solution under UV light irradiation. The intrinsic photoelectrocatalytic activity was found to be highest for the Sn-80%-W-20%-oxide electrode coating. (C) 2017 Elsevier B.V. All rights reserved.