The pattern surface structure of a thin blend polymer film of Poly methyl methacrylate (PMMA)-Poly ethylene glycol (PEG) induced by Ar+ ion etching (5 keV) has been investigated by scanning electron microscopy. Blend polymer films have been obtained consisting of a hydrophilic PEG and a hydrophobic PMMA distributed in co-continuous phases. Four different compositions of the two polymers are dissolved in chloroform and irradiated with gamma rays (Co-60) at 20 kGy to produce transparent films of blend polymer PMMA-PEG after casting. Self-assembled of PMMA-PEG film is obtained because of the high contrast between the two polymers. Ion-polymer interaction with a hydrophilic polymer (Ar+ + PEG) rather than the high etch resistance of hydrophobic polymer (Ar+ -PMMA) was observed. The results are discussed in terms of significant destruction of bonds in the blend polymer films as a result of which one polymer undergoes rapid dissociation rather than the other one. This means that etching with Ar+ ions of the PMMA domains are stable and PEG can be selective. The ATR-FTIR spectrum shows the absence of hydrogen bonds and XRD/DSC curves show the crystanility of PMMA depending on the PEG contents and gamma radiation effect, irradiated blend polymer PMMA/PEG has shown more resistant at thermal degradation than irradiated PMMA. This indicates that the PEG contents have an effect on the thermal stability of PMMA/PEG as detected by TGA. Finally, the pattern surface of irradiated blend polymer (PMMA-2% PEG) was plated with two coaxial layers subsequently of copper (Cu) and silver (Ag) using sputter technique.