Chemical effects of organo-silanized SiO2 nanofillers on epoxy adhesives

Jun Hyuk Heo; Jin Woong Lee; Byoungsang Lee; Hui Hun Cho; Byungkwon Lima; Jung Heon Lee

Journal of Industrial and Engineering Chemistry, Vol.54, 184-189, October, 2017

DOI10.1016/j.jiec.2017.05.032 Export Citation

Chemical effects of organo-silanized SiO2 nanofillers on epoxy adhesives

Jun Hyuk Heo¹, Jin Woong Lee¹, Byoungsang Lee¹, Hui Hun Cho², Byungkwon Lima^{1, †}, and Jung Heon Lee^{1, 2, †}

¹School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU), Suwon 16419, South Korea
²SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU), Suwon 16419, South Korea

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Although thermal and mechanical effects of organo-silanized SiO2 nanofillers (NFs) incorporated into epoxy resins have been actively studied by many researchers, their chemical properties have rarely been reported. In this work, we investigated the chemical effects of organo-silanized SiO2 NFs on epoxy adhesives with (3-glycidoxypropyl) methyldiethoxysilane (GPTMS) and (3-aminopropyl) trimethox- ysilane (APTMS)-functionalized SiO2 NFs. After curing epoxy-functionalized NF (EPOXY-NF) with triethylenetetramine (TETA) hardener, we were able to verify chemical crosslinking of the TETA hardener on EPOXY-NF with X-ray photoelectron spectroscopy, vacuum Fourier-transform infrared spectroscopy, and zeta potential analysis. Similarly, we found that after curing amine-functionalized NF (NH2-NF) with bisphenol A diglycidyl ether (DGEBA) epoxy resin, the resin was chemically crosslinked on NH2-NF as well. Finally, when we evaluated adhesion properties of adhesives composed of DGEBA resin/NH2-NF and TETA hardener/EPOXY-NF on the basis of ASTM D3163, we observed improvements in the shear strength of 79 and 49%, respectively, in comparison with bare SiO2 NF. This suggests that the chemical effects of organo-silanized SiO2 NFs indeed contribute to the adhesion properties of adhesives.

Keywords:Silica nanofiller;Adhesive;Epoxy resin;Adhesive component;Chemical effect

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[2] Kell AJ, Page L, Tan S, Charlebois I, Boissinot M, LeClerc M, Simard B, Nanoscale, 3, 3747 (2011)

[3] Milgroom A, Intrator M, Madhavan K, Mazzaro L, Shandas R, Liu B, Park D, Colloids Surf. B: Biointerfaces, 116, 652 (2014)

[4] Gongalsky MB, Kargina YV, Osminkina LA, Perepukhov AM, Gulyaev MV, Vasiliev AN, Pirogov YA, Maximychev AV, Timoshenko VY, Appl. Phys. Lett., 107, 233702 (2015)

[5] Slowing II, Vivero-Escoto JL, Wu CW, Lin VSY, Adv. Drug Deliv. Rev., 60, 1278 (2008)

[6] Yang P, Gai S, Lin J, Chem. Soc. Rev., 41, 3679 (2012)

[7] Meng LY, Jiang W, Piao W, Meng W, J. Ind. Eng. Chem., 37, 14 (2016)

[8] Banerjee S, Santra S, Tetrahedron Lett., 50, 2037 (2009)

[9] Vansant EF, Voort PVD, Vrancken KC, Characterization and Chemical Modification of the Silica Surface, first ed., Elsevier, Amsterdam, 1995.

[10] Tan W, Wang K, He X, Zhao XJ, Drake T, Wang L, Bagwe RP, Med. Res. Rev., 24, 621 (2004)

[11] Lin W, Huang YW, Zhou XD, Ma Y, Toxicol. Appl. Pharmacol., 217, 252 (2006)

[12] Peng Z, Kong LX, Polym. Degrad. Stabil., 92, 1061 (2007)

[13] Chen Y, Peng Z, Kong LX, Huang MF, Li PW, Polym. Eng. Sci., 48(9), 1674 (2008)

[14] Yang J, Han CR, Duan JF, Xu F, Sun RC, J. Phys. Chem., 117, 8223 (2013)

[15] Zheng Y, Zheng Y, Ning R, Mater. Lett., 57, 2940 (2003)

[16] Zhang H, Zhang Z, Friedrich K, Eger C, Acta Mater., 54, 1833 (2006)

[17] Rosso P, Ye L, Friedrich K, Sprenger S, J. Appl. Polym. Sci., 100(3), 1849 (2006)

[18] Mahrholz T, Stangle J, Sinapius M, Compos. Pt. A-Appl. Sci. Manuf., 40, 235 (2009)

[19] Jana SC, Jain S, Polymer, 42(16), 6897 (2001)

[20] Moriguchi K, Utagawa S, Silane: Chemistry, Applications and Performance, first ed., Nova Science Publisher Inc., New work, 2012.

[21] Sun YY, Zhang ZQ, Wong CP, J. Colloid Interface Sci., 292(2), 436 (2005)

[22] Iijima M, Tsukada M, Kamiya H, J. Colloid Interface Sci., 307(2), 418 (2007)

[23] Bula K, Jesionowski T, Krysztafkiewicz A, Janik J, Colloid Polym. Sci., 285, 1267 (2007)

[24] Chen GD, Zhou SX, Gu GX, Yang HH, Wu LM, J. Colloid Interface Sci., 281(2), 339 (2005)

[25] Huang X, Zheng Y, Jiang P, Yin Y, Dielect. El. In., 17, 635 (2010)

[26] Choi S, Maul S, Stewart A, Hamilton HR, Douglas EP, Polym. Eng. Sci., 53(2), 283 (2013)

[27] Pantoja M, Abenojar J, Martinez MA, Velasco F, Int. J. Adhes. Adhes., 65, 54 (2016)

[28] Singh K, Nanda T, Mehta R, Compos. Pt. A-Appl. Sci. Manuf., 98, 207 (2017)

[29] Stober W, Fink A, Bohn E, J. Colloid Interface Sci., 26, 62 (1968)

[30] Wagner CD, Muilenberg GE, Handbook of X-ray Photoelectron Spectroscopy: A Reference Book of Standard Data for Use in X-ray Photoelectron Spectroscopy, first ed., Perkin-Elmer Corp., Waltham, Massachusetts, 1979.

[31] Du Z, Sun X, Tai X, Wang G, Liu X, RSC Adv., 5, 17194 (2015)

[32] Povstugar VI, Mikhailova SS, Shakov AA, J. Anal. Chem., 55, 405 (2000)

[33] Ciccullo F, Savu SA, Gerbi A, Bauer M, Ovsyannikov R, Cassinese A, Chasse T, Casu MB, Chem. Eur. J., 21, 3766 (2015)

[34] Socrates G, Infrared and Raman Characteristic Group Frequencies: Tables and Charts, third ed., John Wiley & Sons, Inc., Hoboken, New Jersey, 2004.

[35] Pavia DL, Lampman GM, Kriz GS, Vyvyan JA, Introduction to Spectroscopy, fourth ed., Cengage Learning, Boston, 2008.

[36] Murota M, Sato S, Tsubokawa N, Polym. Adv. Technol., 13, 144 (2002)