We synthesized a novel 2-nitrobenzylcarbamate-bearing alkylphosphonic acid derivative. This compound forms a self-assembled monolayer (SAM) on indium tin oxide (ITO), and ultraviolet (UV) irradiation cleaves the carbamate moiety to leave free amino groups. SAMs before and after irradiation were characterized by water contact angle measurement, X-ray photoelectron spectroscopy (XPS), and atomic force microscope (AFM). UV irradiation of the SAM through a photomask enabled fabrication of a patterned amine surface with 20 mu m line-width, which was visualized by selective deposition of fluorescein particles containing carboxy groups.