Two new near-UV and visible-light-sensitive photobase generators (PBGs) are synthesized and investigated. They are built on a near-UV and visible light sensitive (E)-3-(2,2'-bithiophen-5-yl)-2-cyanoacrylic acid chromophore and a latent strong base such as 1,8-diazabicyclo[5.4.0]undec-7-ene (DBU) and 1,5,7-triazabicyclo[4.4.0]dec-5-ene (TBD). Upon irradiation, decarboxylation occurs and the base is released. The anionic curing of epoxy/thiol as well as thiol/divinylsulfone formulations in the presence of these PBGs under LEDs at 385 and 405 nm is studied. More than 60% of conversion of the thiol and epoxy functions is achieved upon LED@385 nm without any post baking. (C) 2017 Elsevier Ltd. All rights reserved.