화학공학소재연구정보센터
Journal of Industrial and Engineering Chemistry, Vol.57, 322-329, January, 2018
Atmospheric pressure plasma of C2F6/N2 for the decomposition of C2F6 in a dielectric barrier discharge
E-mail:
Effects of operating parameters on the decomposition of C2F6 in a mixture with N2 were investigated in an atmospheric pressure plasma. A stretching of the Lissajous pattern and increase in intensity of voltage/ current were results of the voltage variation, while the variation of frequency induced a major stretch of current intensity, and maintained the Lissajous pattern. Consumed power and conversion of C2F6 increased with the applied voltage/frequency, whereas a decrease in the total flow rate/initial C2F6 concentration led to high conversion of C2F6. A high-energy efficiency was obtained at a low applied frequency and a high initial C2F6 concentration.
  1. Pacala S, Socolow R, Science, 305, 968 (2004)
  2. Bank TW, 2017 World Development Indicators: Trends in Greenhouse Gas Emissions, The World Bank, 2017.
  3. Houghton JT, Ding Y, Griggs DJ, Noguer M, Van Der Linden PJ, Dai X, Maskell K, Johnson CA, Radiative Forcing of Climate Change, CambridgeUniversity Press Cambridge, p 349 2001.
  4. Delattre JL, Friedman TL, Stacy AM, J. Vac. Sci. Technol. B, 17(6), 2664 (1999)
  5. Lee MC, Choi W, J. Ind. Eng. Chem., 10(1), 107 (2004)
  6. Jasinski M, Mizeraczyk J, Zakrzewski Z, Chang JS, Czech. J. Phys., 52, 743 (2002)
  7. Chang MB, Chang JS, Ind. Eng. Chem. Res., 45(12), 4101 (2006)
  8. UNFCCC, CDM Methodology Booklet, 8 ed., UNFCCC, 2016.
  9. McCulloch A, Incineration of HFC-23 Waste Streams for Abatement of Emissions from HCFC-22 Production: A Review of Scientific, Technical and Economic Aspects, UNFCCC, 2005.
  10. Kennedy EM, Kundu SK, Mackie JC, Holdsworth CI, Molloy TS, Gaikwad VV, Dlugogorski BZ, Ind. Eng. Chem. Res., 51(34), 11279 (2012)
  11. Chang MB, Lee HM, Catal. Today, 89(1-2), 109 (2004)
  12. Urashima K, Kostov KG, Chang J, Shih X, Okayasa Y, Iwaizumi T, Yoshimura K, Kato T, IEEE Trans. Ind. Appl., 37, 1456 (2001)
  13. Takaki K, Urashima K, Chang JS, IEEE Trans. Plasma Sci., 32, 2175 (2004)
  14. Kim DH, Mok YS, Lee SB, Shin SM, J. Zhejiang Univ. Sci. A, 11, 538 (2010)
  15. Takaki K, Urashima K, Chang JS, Thin Solid Films, 506, 414 (2006)
  16. Chang MB, Yu SJ, Environ. Sci. Technol., 35, 1587 (2001)
  17. Mok YS, in: E. Carayannis (Ed.), Destruction of Fluorinated Greenhouse Gases by Using Nonthermal Plasma Process, INTECH Open Access Publisher, pp.289-312 2011.
  18. Kabouzi Y, Moisan M, Rostaing JC, Trassy C, Guerin D, Keroack D, Zakrzewski Z, J. Appl. Phys., 93, 9483 (2003)
  19. Radoiu MT, Radiat. Phys. Chem., 69, 113 (2004)
  20. Lee HM, Chang MB, Wu KY, J. Air Waste Manage. Assoc., 54, 960 (2004)
  21. Xie HD, Sun B, Zhu XM, J. Hazard. Mater., 168(2-3), 765 (2009)
  22. Hartz CL, Bevan JW, Jackson MW, Wofford BA, Environ. Sci. Technol., 32, 682 (1998)
  23. Mohindra V, Chae H, Sawin HH, Mocella MT, IEEE Trans. Semicond. Manuf., 10, 399 (1997)
  24. Vitale SA, Sawin HH, J. Vac. Sci. Technol. A, 18(5), 2217 (2000)
  25. Nguyen DB, Lee WG, J. Ind. Eng. Chem., 20(3), 972 (2014)
  26. Nguyen DB, Lee WG, Chem. Eng. J., 294, 58 (2016)
  27. Tu X, Gallon HJ, Twigg MV, Gorry PA, Whitehead JC, J. Phys. D-Appl. Phys., 44, 274007 (2011)
  28. Ozkan A, Dufour T, Silva T, Britun N, Snyders R, Bogaerts A, Reniers F, Plasma Sources Sci. Technol., 25, 025013 (2016)
  29. Ozkan A, Bogaerts A, Reniers F, J. Phys. D-Appl. Phys., 50, 084004 (2017)
  30. Ramakers M, Michielsen I, Aerts R, Meynen V, Bogaerts A, Plasma Process. Polym., 12, 755 (2015)
  31. Nguyen DB, Lee WG, RSC Adv., 6, 26505 (2016)
  32. Nguyen DB, Lee WG, Chem. Eng. Commun., 203(7), 917 (2016)
  33. Nguyen DB, Lee WG, J. Ind. Eng. Chem., 52, 7 (2017)
  34. Nguyen DB, Lee WG, J. Ind. Eng. Chem., 32, 187 (2015)
  35. Zhang X, Xiao H, Hu X, Gui Y, AIP Adv., 6, 115005 (2016)
  36. Song X, Yi L, Xiaoxing Z, Ju T, Shuangshuang T, Zaitao D, J. Phys. D-Appl. Phys., 50, 155601 (2017)
  37. Nguyen DB, Hong SE, Koo HS, Lee WG, Chem. Eng. Commun., 204(5), 529 (2017)
  38. Pearse RWB, Gaydon AG, The Identification of Molecular Spectra, 4th ed., Chapman and Hall London, 1976.
  39. Fanelli F, Fracassi F, d'Agostino R, Plasma Process. Polym., 5, 424 (2008)
  40. Nguyen DB, Lee WG, Korean J. Chem. Eng., 33(3), 844 (2016)
  41. Toyoda H, Komiya H, Itakura H, J. Electron. Mater., 9, 569 (1980)
  42. Schaepkens M, Oehrlein GS, J. Electrochem. Soc., 148(3), C211 (2001)