Effects of growth temperature on titanium carbide (TiC) film formation using low-frequency (60 Hz) plasma-enhanced chemical vapor deposition

Hong Tak Kim; Sung-Youp Lee; Hyeong-Rag Lee; Chinho Park

Korean Journal of Chemical Engineering, Vol.35, No.1, 246-250, January, 2018

DOI10.1007/s11814-017-0243-6 Export Citation

Effects of growth temperature on titanium carbide (TiC) film formation using low-frequency (60 Hz) plasma-enhanced chemical vapor deposition

Hong Tak Kim, Sung-Youp Lee¹, Hyeong-Rag Lee¹, and Chinho Park^†

School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea
¹Department of Physics, Kyungpook National University, Daegu 41566, Korea

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TiC films were formed by low-frequency (60Hz) plasma-enhanced chemical vapor deposition (LFPECVD) using TiCl4, CH4, and H2 gas mixtures. The effects of the growth temperature and feasibility for the on-glass deposition of TiC films were investigated. The growth kinematics of TiC films was controlled mainly by surface-reactions below 450 °C, and dominated by a mass-transfer process above 450 °C. The films exhibited a face-centered cubic structure, and the preferred orientation of film growth was mainly the (200) plane. The [C]/[Ti] ratio was over-stoichiometric below 400 °C, and became almost stoichiometric above 450 °C. The optical properties of the films were characterized by high reflectance in near infrared (NIR) region and a steep edge in the visible region, and the reflectance in the NIR region increased gradually with increasing temperature. As a result, LF-PECVD is a useful technique to acquire Cl-free TiC films at relatively low temperatures.

Keywords:Low-frequency;PECVD;Plasma;Titanium Carbide;TiC

[References]

Mani A, Aubert P, Mercier F, Khodja H, Berthierd C, Houdy P, Surf. Coat. Technol., 194, 190 (2005)
Gao XH, Guo ZM, Geng QF, Ma PJ, Liu G, Sol. Energy Mater. Sol. Cells, 157, 543 (2016)
Zhao C, Wang Q, Zhang H, Passerini S, Qian X, ACS Appl. Mater. Interfaces, 8, 15661 (2016)
Pierson HO, Handbook of Chemical Vapor Deposition, Noyes Publications, Park Ridge, NJ (1999).
Rohrer J, Hyldgaard P, Phys. Rev. B, 82, 045415 (2010)
Lieberman MA, Lichtenberg AJ, Principle of Plasma Discharges and Materials Processing, Wiley, NY (1994).
Fridman A, Plasma Chemistry, Cambridge University Press, New York, NY (2008).
Kim HT, Kim CD, Pyo MS, Park C, Korean J. Chem. Eng., 31(10), 1892 (2014)
Kim HT, Park DK, Choi WS, J. Korean Phys. Soc., 42, S916 (2003)
Kim HT, Kim MJ, Sohn SH, J. Phys. Chem. Solids, 73, 931 (2012)
Kim HT, Sohn SH, Vacuum, 86, 2148 (2012)
Shinde NM, Deokate RJ, Lokhande CD, J. Anal. Appl. Pyrolysis, 100, 12 (2013)
Chen L, Park C, Korean J. Chem. Eng., 34(4), 1187 (2017)
Qian M, Froes FH, Titanium Powder Metallurgy: Science, Technology and Applications, Butterworth-Heinemann, Waltham, MA (2015).
Kim HT, Mun T, Park C, Jin SW, Park HY, J. Power Sources, 244, 641 (2013)
Huston PL, Chemical Kinetics and Reaction Dynamics, McGraw-Hill, New York, NY (2001).
Fair RB, Rapid Thermal Processing, Academic Press, Boston, MA (1993).
Adachi S, The Handbook on Optical Constants of Metals: In Tables and Figures, World Scientific, Singapore (2013).

[Referenced By]

[1] Mani A, Aubert P, Mercier F, Khodja H, Berthierd C, Houdy P, Surf. Coat. Technol., 194, 190 (2005)

[2] Gao XH, Guo ZM, Geng QF, Ma PJ, Liu G, Sol. Energy Mater. Sol. Cells, 157, 543 (2016)

[3] Zhao C, Wang Q, Zhang H, Passerini S, Qian X, ACS Appl. Mater. Interfaces, 8, 15661 (2016)

[4] Pierson HO, Handbook of Chemical Vapor Deposition, Noyes Publications, Park Ridge, NJ (1999).

[5] Rohrer J, Hyldgaard P, Phys. Rev. B, 82, 045415 (2010)

[6] Lieberman MA, Lichtenberg AJ, Principle of Plasma Discharges and Materials Processing, Wiley, NY (1994).

[7] Fridman A, Plasma Chemistry, Cambridge University Press, New York, NY (2008).

[8] Kim HT, Kim CD, Pyo MS, Park C, Korean J. Chem. Eng., 31(10), 1892 (2014)

[9] Kim HT, Park DK, Choi WS, J. Korean Phys. Soc., 42, S916 (2003)

[10] Kim HT, Kim MJ, Sohn SH, J. Phys. Chem. Solids, 73, 931 (2012)

[11] Kim HT, Sohn SH, Vacuum, 86, 2148 (2012)

[12] Shinde NM, Deokate RJ, Lokhande CD, J. Anal. Appl. Pyrolysis, 100, 12 (2013)

[13] Chen L, Park C, Korean J. Chem. Eng., 34(4), 1187 (2017)

[14] Qian M, Froes FH, Titanium Powder Metallurgy: Science, Technology and Applications, Butterworth-Heinemann, Waltham, MA (2015).

[15] Kim HT, Mun T, Park C, Jin SW, Park HY, J. Power Sources, 244, 641 (2013)

[16] Huston PL, Chemical Kinetics and Reaction Dynamics, McGraw-Hill, New York, NY (2001).

[17] Fair RB, Rapid Thermal Processing, Academic Press, Boston, MA (1993).

[18] Adachi S, The Handbook on Optical Constants of Metals: In Tables and Figures, World Scientific, Singapore (2013).