Journal of Crystal Growth, Vol.490, 89-96, 2018
Characterization of double Shockley-type stacking faults formed in lightly doped 4H-SiC epitaxial films
Double Shockley-type stacking faults (2SSFs) formed in 4H-SiC epitaxial films with a dopant concentration of 1.0 x 10(16) cm (3) were characterized using grazing incident X-ray topography and high-resolution scanning transmission electron microscopy. The origins of 2SSFs were investigated, and it was found that 2SSFs in the epitaxial layer originated from narrow SFs with a double Shockley structure in the substrate. Partial dislocations formed between 4H-type and 2SSF were also characterized. The shapes of 2SSFs are related with Burgers vectors and core types of the two Shockley partial dislocations. (C) 2018 Elsevier B.V. All rights reserved.
Keywords:Crystal structure;Defects;Nanostructures;X-ray topography;Chemical vapor deposition processes;Semiconducting silicon compounds