텅스텐산화물 막의 균일한 표면 형상에 의한 향상된 전기변색 성능

김규호; 구본율; 안효진; Kue-Ho Kim; Bon-Ryul Koo; Hyo-Jin Ahn

Korean Journal of Materials Research, Vol.28, No.7, 411-416, July, 2018

DOI10.3740/MRSK.2018.28.7.411 Export Citation

텅스텐산화물 막의 균일한 표면 형상에 의한 향상된 전기변색 성능

Enhanced Electrochromic Performance by Uniform Surface Morphology of Tungsten Oxide Films

김규호¹, 구본율², 안효진 ^{3, 2, †}

¹서울과학기술대학교 신소재공학과
²서울과학기술대학교 의공학-바이오소재 융합 협동과정 신소재공학프로그램
³신소재공학과

Kue-Ho Kim¹, Bon-Ryul Koo², and Hyo-Jin Ahn^{1, 2, †}

¹Department of Materials Science and Engineering, Seoul National University of Science and Technology, Korea
²Program of Materials Science & Engineering, Convergence Institute of Biomedical Engineering and Biomaterials, Seoul National University of Science and Technology, Seoul 01811, Republic of Korea

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Tungsten oxide(WO3) films with uniform surface morphology are fabricated using a spin-coating method for applications of electrochromic(EC) devices. To improve the EC performances of the WO3 films, we control the heating rate of the annealing process to 10, 5, and 1 oC/min. Compared to the other samples, the WO3 films fabricated at a heating rate of 5 oC/min shows superior EC performances for transmittance modulation(49.5 %), response speeds(8.3 s in a colored state and 11.2 s in a bleached state), and coloration efficiency(37.3 cm2/C). This performance improvement is mainly related to formation of a uniform surface morphology with increased particle size without any cracks by an optimized annealing heating rate, which improves the electrical conductivity and electrochemical activity of the WO3 films. Thus, the WO3 films with a uniform surface morphology prepared by the optimized annealing heating rate can be used as a potential candidate for performance improvement of the EC devices.

Keywords:electrochromic performance;annealing heating rate;tungsten oxide;film structure;spin-coating

[References]

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[3] Stec GJ, Lauchner A, Cui Y, Nordlander P, Halas NJ, ACS Nano, 11, 3254 (2017)

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[11] Brezesinski T, Rohlfing DF, Sallard S, Antonietti M, Smarsly BM, Small, 2, 1203 (2006)

[12] Mukherjee R, Sahay PP, J. Alloy. Compd., 660, 336 (2016)

[13] Bathe SR, Patil PS, Sol. Energy Mater. Sol. Cells, 91(12), 1097 (2007)

[14] Stanciu LA, Kodash VY, Groza JR, Metall. Mater. Trans. A-Phys. Metall. Mater. Sci., 32A, 2633 (2001)

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[18] Burkhardt S, Elm MT, Lani-Wayda B, Klar PJ, Adv. Mater. Interfaces, 5, 170158 (2018)

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[21] Hitchman ML, Thin Solid Films, 61, 341 (1979)

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[23] Zhu JH, Wei SY, Alexander M, Dang TD, Ho TC, Guo ZH, Adv. Funct. Mater., 20(18), 3076 (2010)

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