Numerical simulations are performed for evaporation-induced particle line formation on a moving substrate by solving the conservation equations of mass, momentum, energy, vapor concentration, and particle concentration in the liquid-gas phases. The liquid-gas interface and the liquid-gas-solid contact line are tracked by using a level-set method, which is modified to include the effects of contact line, phase change, and particle concentration. The numerical results for liquid evaporation and particle deposition in confined convective coating between two parallel plates showed that the substrate velocity is a key parameter determining the particle deposition pattern and the particle line formation can be controlled by varying the substrate velocity.