A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound (vol 36, pg 2261, 1998)

Seino H; Mochizuki A; Haba O; Ueda M

Journal of Polymer Science Part A: Polymer Chemistry, Vol.36, No.17, 3197-3197, 1998

DOI10.1002/(SICI)1099-0518(199812)36:17<3197::AID-POLA23>3.0.CO;2-3 Export Citation

A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound (vol 36, pg 2261, 1998)

Seino H, Mochizuki A, Haba O, Ueda M