In this work, magnetron sputtered Nb2O5 films were obtained at two different deposition times. The surface chemistry of the deposited layers was investigated by X-ray photoelectron spectroscopy (XPS). The corrosion behavior was assessed by electrochemical impedance spectroscopy, potentiodynamic polarization and potentiostatic polarization tests in 0.5M H2SO4 + 2 ppm HF solution at room temperature. The Nb5+/Nb4+ ratio decreased with the deposition time, leading to a higher surface activity for the film obtained at 30 min. This result was confirmed by its lower impedance values and higher current densities when compared to the 15'-film. Surface chemistry played a major role on the corrosion behavior of the sputtered films and can be tailored by the deposition time.