Ellipsometry is an optical technique for determining properties of laminar reflecting (or transmitting) structures from the measurement of light polarization state change resulting from the light-sample interaction. In all but the simplest of cases, the measurements must be followed by data processing in which the measured data is compared to an appropriate mathematical model of the sample derived from Maxwell's equations and measurement conditions. Thus a key common problem is determining how many and which measurements to make. A single measurement in standard ellipsometry consists of one complex data point and in generalized ellipsometry, three complex data points and therefore usually more than one measurement is required. Previously we have addressed these problems using Complex Analysis in the n-k plane for homogeneous isotropic films. One of the key findings was that certain angles and wavelengths are useful and others are not. The purpose of the work here is to extend that analysis to anisotropic films. These films have a greater number of unknowns and consequently may require more measurements. The central question remains, how many measurements are needed and which specific measurements will provide sufficiently independent equations considering the unknowns. It can be that additional measurements vary to such a small degree that they are not useful considering measurement error tolerance. The work to be presented will show how to identify useful measurements based upon the anticipated, non-depolarizing sample configuration. The approach avoids making unnecessary measurements which can actually reduce the solution accuracy.