화학공학소재연구정보센터
Applied Chemistry for Engineering, Vol.30, No.1, 88-94, February, 2019
고분자 박막 내에 담지 된 실리카 마이크로입자의 광산란 효과에 의한 광에너지 상향전환 효율 향상
Light Scattering-enhanced Upconversion Efficiency in Silica Microparticles-embedded Polymeric Thin Film
E-mail:
초록
삼중항-삼중항 소멸에 의한 광에너지 상향전환 기술(triplet-triplet annihilation upconversion, TTA-UC)은 특정 조건을 만족시키는 유기물들의 에너지 전달 및 융합 과정에 의해 저에너지의 광자를 고에너지의 광자로 변환시키는 신개념에너지 전환기술이다. 본 연구에서는 실리카 마이크로입자(silica microparticle, SM)를 UC가 구현되는 폴리우레탄 박막내에 담지 시켜 입사되는 광원의 광산란 효과를 도모함으로써 TTA-UC 효율을 향상시키고, 그 기작에 대해 탐구하였다. Seeded growth method를 통하여 약 950 nm의 균일한 크기를 갖는 SM을 합성하였으며, UC 박막 내에 담지 된 SM의 농도를 증가시킴에 따라 635 nm 광원 조사 시 430-570 nm 영역에서의 UC 세기가 최대 1.64배 증가함을 확인하였다. 삼중항 lifetime 측정을 통하여 광감응제 PdTPBP와 전자수용체 perylene 간의 triplet-triplet energy transfer(TTET) 효율을 분석한 결과, 박막 내에 담지 된 SM이 chromophore 간의 TTET에 미치는 영향은 미미한 것으로 나타났다. 또한, 입사 강도-UC 세기의 상관관계를 분석하여 TTA-UC 효율을 분석한 결과, SM이 박막 내에 존재할 경우 UC 양자효율이 최대 1.5배 향상됨을 확인하였다.
Triplet-triplet annihilation upconversion (TTA-UC) is a photochemical process wherein two or more low-energy photons are converted to a high-energy photon through a special energy transfer mechanism. Herein, we report a strategy to enhance the efficiency of TTA-UC through the light-scattering effect induced by silica microparticles (SM) embedded in polymeric thin films. By incorporating monodisperse uniform silica microparticles with a uniform size of 950 nm synthesized by Stober-based seeded growth method into UC polymeric thin films, the UC intensity in the 430-570 nm range was enhanced by as much as 64% when irradiated by 635 nm laser. Analyzing the lifetime of PdTPBP phosphorescence revealed that the presence of SM in the UC layer does not affect triplet-triplet energy transfer (TTET) between sensitizers and acceptors, supporting the enhancement of TTA-UC originated from the light-scattering effect. On the other hand, the incorporation of SM in UC layer is shown to enhance the triplet-triplet annihilation (TTA) efficiency, which results in a 1.5-fold increase of the ΦUC, by scattering light source and thus increasing the number of excited photons to be utilized in TTA-UC process.
  1. Hill SP, Hanson K, J. Am. Chem. Soc., 139(32), 10988 (2017)
  2. Kim HI, Weon S, Kang H, Hagstrom AL, Kwon OS, Lee YS, Choi W, Kim JH, Environ. Sci. Technol., 50, 11184 (2016)
  3. Liu Q, Xu M, Yang T, Tian B, Zhang X, Li F, ACS Appl. Mater. Interfaces, 10, 9883 (2018)
  4. Huang L, Zhao Y, Zhang H, Huang K, Yang J, Han G, Angew. Chem.-Int. Edit., 56, 14400 (2017)
  5. Singh-Rachford TN, Castellano FN, Coord. Chem. Rev., 254, 2560 (2010)
  6. Sasaki Y, Amemori S, Kouno H, Yanai N, Kimizuka N, J. Mater. Chem. C, 5, 5063 (2017)
  7. Yakutkin V, Aleshchenkov S, Chernov S, Miteva T, Nelles G, Cheprakov A, Baluschev S, Chem. Eur. J., 14, 9846 (2008)
  8. Mase K, Sasaki Y, Sagara Y, Tamaoki N, Weder C, Yanai N, Kimizuka N, Angew. Chem.-Int. Edit., 57, 2806 (2018)
  9. Qu Z, Duan P, Zhou J, Wang Y, Liu M, Nanoscale, 10, 985 (2018)
  10. Singh-Rachford TN, Castellano FN, J. Phys. Chem. A, 113(20), 5912 (2009)
  11. Yanai N, Kozue M, Amemori S, Kabe R, Adachi C, Kimizuka N, J. Mater. Chem. C, 4, 6447 (2016)
  12. Meinardi F, Ehrenberg S, Dhamo L, Carulli F, Mauri M, Bruni F, Simonutti R, Kortshagen U, Brovelli S, Nat. Photonics, 11, 177 (2017)
  13. Ahn JB, Noh ST, J. Korean Ind. Eng. Chem., 19(6), 685 (2008)
  14. Fu YH, Kuznetsov AI, Miroshnichenko AE, Yu YF, Luk’yanchuk B, Nat. Commun., 4, 1527 (2013)
  15. Tsutsui T, Yahiro M, Yokogawa H, Kawano K, Adv. Mater., 13(15), 1149 (2001)
  16. Yamasaki T, Sumioka K, Tsutsui T, Appl. Phys. Lett., 76, 1243 (2000)
  17. Tao R, Zhao J, Zhong F, Zhang C, Yang W, Xu K, Chem. Commun., 51, 12403 (2015)
  18. Han YD, Lu ZY, Teng ZG, Liang JL, Guo ZL, Wang DY, Han MY, Yang WS, Langmuir, 33(23), 5879 (2017)
  19. Stober W, Fink A, Bohn E, J. Colloid Interface Sci., 26, 62 (1968)
  20. Zhao B, Tian C, Zhang Y, Tang T, Wang F, Particuology, 9, 314 (2011)
  21. Lee SH, Ayer MA, Vadrucci R, Weder C, Simon YC, Polym. Chem., 5, 6898 (2014)
  22. Hagstrom AL, Lee HL, Lee MS, Choe HS, Jung J, Park BG, Han WS, Ko JS, Kim JH, Kim JH, ACS Appl. Mater. Interfaces, 10, 8985 (2018)
  23. Ogawa T, Hosoyamada M, Yurash B, Nguyen TQ, Yanai N, Kimizuka N, J. Am. Chem. Soc., 140(28), 8788 (2018)