Journal of Crystal Growth, Vol.509, 35-39, 2019
Growth of CdMnTe free of large Te inclusions using the vertical Bridgman technique
We grew Cd1-xMnx Te crystals with a nominal composition of 5% Mn and 95% Cd using the vertical Bridgman technique. We were able to grow crystals from as-received starting material that were free of secondary phases, such as Te inclusions with a size > 1-1.mu m diameter, without adding compensating Cd to the initial charge. The Te precipitations (size < 1-1.mu m diameter) were found to segregate towards the last-to-freeze section of the ingot. Te inclusions with a size 5-7 mu m were observed at the grain boundary located near the last-to-freeze section, while the bottom and middle parts of the ingot showed no Te inclusions, even at the grain boundaries. X-ray topographic analysis was used to characterize the distribution of thermal stress in the ingot.
Keywords:Characterization;Extended defects;Sub-grain boundary network;Bridgman;CdMnTe;Semiconducting II-VI materials