Journal of Crystal Growth, Vol.508, 42-49, 2019
Heterogeneous twinning during directional solidification of multi-crystalline silicon
Heterogeneous twinning nucleation from the wall or gas interface during directional solidification of silicon have been modelled, and further used to clarify the details of twining observed in situ in X-ray synchrotron imaging experiments (Tsoutsouva a al., 2016). It is found that the heterogeneous twinning from the wall/grains or wall/gas/grain trijunctions requires much lower undercoolings leading to much higher twinning probability. The lower attachment energy and the contact area are the key factors for the heterogeneous nucleation of twins.