Dense ZnO films with a strong c-axis texture have been deposited on transparent conductive oxide glass, glass, and Si wafers, respectively, with a two-step pressureless wet chemical method using zinc acetate dihydrate as Zn-precursor. The crystallographic structure of the films has been studied with XRD and scanning electron microscopy. Optical measurements reveal a high transparency of the ZnO films with a thickness of up to 10 m. This new cost-effective route for ZnO film deposition does not require expensive sophisticated equipment and is easily upscaled.