화학공학소재연구정보센터
Materials Chemistry and Physics, Vol.221, 361-366, 2019
Effect of post-deposition thermal treatment on thermoelectric properties of pulsed-laser deposited Ca3Co4O9 thin films
Due to its high positive Seebeck coefficient (125 mu V K-1) and low electrical resistivity (10-40 m Omega cm) Ca3Co4O9 is a material of interest for thermoelectric power generator-based metal-oxide thin films. In the present work, we emphasize the tremendous role of ex-situ thermal treatment on the structural, electrical and low temperature thermoelectric properties of PLD grown Ca3Co4O9 thin films. We evidence a crystallization of the Ca3Co4O9 misfit layer between 873 K and 923 K, allowing a tailoring of the thermoelectric properties of Ca3Co4O9. A high maximum power factor of 2 x 10(-4) WM-1 K-2 at room temperature is attained for the most performing films.