In this work, we investigate the use of advanced hydrogenation and low-temperature diffusion processes (a 3 h 700 degrees C process after emitter diffusion) for the electrical neutralization of laser-induced defects for laser doped and grooved solar cells. Despite the laser doping and grooving (LDG) process being performed before silicon nitride passivation to avoid thermal expansion mismatch between the silicon and the silicon nitride layer, some crystallographic defects are still formed during the process. The application of a low-temperature diffusion process increases implied open circuit voltages by 14 mV, potentially due to phosphorus diffusion of dislocated regions induced during laser processing. Laser hydrogenation is shown to be capable of passivating the majority of the remaining laser-induced defects. Over 1% absolute improvement in efficiency is achieved on cells with a full area aluminum back surface field. Preliminary results with minimal optimization demonstrate efficiencies of over 19% with a full area Al back contact cell. The potential to achieve much higher voltages when used with a passivated rear is also demonstrated.