Large area monolayer molybdenum disulfide (MoS2) film grown on silica/silicon substrate was synthesized using a catalyst perylene-3, 4, 9, 10-tetracarboxylic acid tetrapotassium salt (PTAS) by the method of chemical vapor deposition. The properties of the monolayer MoS2 film were characterized using a number of techniques. The optical microscope images show the film is uniform and continuous on a large scale. The 0.7 nm film thickness measured by atomic force microscope, as well as the difference of 20 cm(-1) between the two characteristic Raman peaks, all prove that the film is single layer. The strong photoluminescence spectrum and image as well as the x-ray diffraction indicate that the monolayer MoS2 film has a good quality. The MoS2 film synthesized under the same conditions without PTAS was also characterized as a comparison. The results show that the MoS2 film tends to thicker without using PTAS, suggesting that PTAS can not only promote the formation of the MoS2 seeding, but also induce horizontal growth of the MoS2 film on the substrate.