Herein is reported the preparation of nanostructured mesoporous supported films, in this case, titanium dioxide nanoparticles on silicon wafer, according to a new approach taking place in two consecutive deposition steps: (i) coating of a homogeneous and continuous layer of a surfactant on the selected support and (ii) building up of a second layer of the fresh metal-oxide gel precursor, followed by thermal treatment to generate porosity. This approach represents an alternative way to soft-template procedures, as for instance, the largely applied evaporation-induced self-assembly (EISA) method, which typically consists of a single-step deposition of the mixture of gel precursor and surfactant used as a soft template to create porosity. The main advantage of the procedure reported here compared to the EISA method is the possibility of reaching tunable textural characteristics along the growing film (pore size, shape, and distribution of pores) by using gels with nanoparticles preformed at different stages via a simple regulation of the residence time of the precursors deposited on the support containing the surfactant.