Limited strategies have been established to prepare core-shell structured Si@SiO2@NC (N-doped carbon). In this study, a novel method is reported to obtain Si@SiO2@NC by treating the surface of Si nanoparticles with oxygen plasma, which exhibits excellent electrochemical performance. Significantly, compared with calcination in air and alkali treatment to obtain the SiO2 surface layer, the synthetic approach reported here is facile and inexpensive, making it more appropriate for mass production of a better performance anode.