Optical emission spectroscopy and mass spectrometry was used to characterize gaseous plasma in an industrial reactor of volume 5 m(3) during deposition of protective coatings. Plasma was created in mixtures of hexamethyldisiloxane (HMDSO) and oxygen at the powers between 1 and 8 kW. The plasma density was somehow below 10(14) m(-3). The flows of both gases were varied up to 200 sccm while the effective pumping speed was adjusted by changing the roots pump rotation speed between 250 and 4000 rpm. At such conditions the HMDSO was only partially dissociated to fragments. The behaviour of optical emission lines and mass ion currents was well correlated indicating that even one single technique was sufficient to monitor the behaviour of plasma at various discharge conditions. The optical emission spectroscopy as a simple and economic method is therefore suitable for controlling key processing parameters in such a plasma reactor.