Construction of a reactive magnetron rf plasma deposition system with cylindrical electrodes is presented. Design of an individual electrode equipped with integrated multiple electromagnet system together with the characteristics of its magnetic field is described. Properties of magnetron discharge and plasma geometry are also presented. Deposition of organogermanium films from tetraethylgermanium in magnetically enhanced rf plasma is discussed in terms of deposition rates and general properties of the films with the particular attention paid to their density. Both, elemental composition of these films by electron spectroscopy for chemical analysis and their chemical functionality by Fourier transform infrared spectroscopy are also given. The main advantage of magnetic field enhancement is local increase of plasma density restricting the discharge, and consequently deposition, to the desired volume. Additionally, the application of a system of integrated electromagnets enables the use of magnetic field intensity as an independent process optimization parameter.