Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.12, No.6, 3176-3179, 1994 DOI10.1116/1.579234 Export Citation Enhancement of the Deposition Rate of TiO2 Film in Radio-Frequency Reactive Sputtering Sekiguchi H, Kanzawa A, Imai T, Honda T [Referenced By] Please enable JavaScript to view the comments powered by Disqus.
