Journal of Vacuum Science & Technology A, Vol.13, No.2, 244-247, 1995
Effect of the Predecomposition of Sif4 on the Properties of Silicon Dioxide Deposited at Low-Temperatures Using Sif4/SiH4/N2O in a Double-Plasma Process
Keywords:CHEMICAL VAPOR-DEPOSITION;HIGH-QUALITY;SUBSTRATE TEMPERATURES;THIN-FILMS;SIO2-FILMS;NITRIDE;SIO2