Journal of Vacuum Science & Technology A, Vol.13, No.2, 394-399, 1995
Substrate Amorphization Induced by the Sputter-Deposition Process - Geometrical Aspects
Keywords:ION-BEAM DEPOSITION;X-RAY PHOTOELECTRON;ELECTRON-EMISSION;GROWTH;GE;FILMS;BOMBARDMENT;DIFFRACTION;GERMANIUM;SURFACES